NTU Course

Advanced Metrology for Semiconductor Manufacturing

Offered in 112-2
  • Serial Number

    25334

  • Course Number

    ME5051

  • Course Identifier

    522 U6260

  • No Class

  • 3 Credits
  • Elective

    DEPARTMENT OF MECHANICAL ENGINEERING / GRADUATE INSTITUTE OF MECHANICAL ENGINEERING

      Elective
    • DEPARTMENT OF MECHANICAL ENGINEERING

    • GRADUATE INSTITUTE OF MECHANICAL ENGINEERING

  • WEI-EN FU
  • Thu A, B, C
  • 工綜205

  • Type 2

  • 30 Student Quota

    NTU 30

  • No Specialization Program

  • Chinese
  • NTU COOL
  • Notes
  • NTU Enrollment Status

    Enrolled
    0/30
    Other Depts
    0/0
    Remaining
    0
    Registered
    0
  • Course Description
    The feature sizes involved for advanced technology nodes in semiconductor manufacturing continue to plunge into nanoscale levels. The demands for more effective and accurate measurements both in-line and off-line in the processes with feature sizes below a few nanometers are urgent and critical. This course intends to deliver fundamental concepts and practical aspects of semiconductor metrology for those frequently used characterization tools in device fabrication to students.
  • Course Objective
    The following contents will be covered as: -Nanoscale metrology and instrumentations -FEOL Critical dimension measurements in Semiconductor Manufacturing -Film thickness measurements: X-Ray Reflection (XRR), Spectroscopic Ellipsometry (SE) -Particle Metrology, Defects and Inspections After completing the course the student should be able to: -Describe fundamentals of measurement principles for nanometrology -Evaluate the “metrology” for Critical Dimensions in front end processes -Explain the inline inspections for nanoparticles -Assess analytical methods for film thickness
  • Course Requirement
  • Expected weekly study hours before and/or after class
  • Office Hour
  • Designated Reading
  • References
    No textbook assigned, but selected readings can be found from the following books Semiconductor and Nano Metrology Related: Metrology and Diagnostic Techniques for Nanoelectronics, CRC Press, 2017, Zhiyong Ma Semiconductor Nanotechnology Advances in Information and Energy Processing and Storage, Springer, 2018, Stephen M. Goodnick 3D Microelectronic Packaging From Fundamentals to Applications, Springer, 2017, Yan Li Introduction to Metrology Applications in IC Manufacturing, SPIE, 2015, Bo Su, Eric Solecky, Alok Vaid X-Ray Related: X-Ray Metrology in Semiconductor Manufacturing, Taylor & Francis, 2006, D. Keith Bowen Elements of modern X-ray physics, Jens Als-Nielsen, 2001, John Wiely and Sons X-Ray Diffraction: In Crystals, Imperfect Crystals, and Amorphous Bodies (Dover Books on Physics), 1994, A Guinier Methods of X-ray and Neutron Scattering in Polymer Science, Oxford University Press, 2000, R.-J. Roe Soft X-Rays and Extreme Ultraviolet Radiation: Principles and Applications, 2012, D. Attwood
  • Grading
  • Adjustment methods for students
  • Make-up Class Information
  • Course Schedule