NTU Course
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Advanced Materials: Fundamentals and Applications

Offered in 112-2
  • Serial Number

    40288

  • Course Number

    Phys8150

  • Course Identifier

    222 D5480

  • No Class

  • 3 Credits
  • Elective

    GRADUATE INSTITUTE OF PHYSICS / TIGP-MOLECULAR SCIENCE AND TECHNOLOGY / Taiwan International Graduate Program for Sustainable Chemical Science

      Elective
    • GRADUATE INSTITUTE OF PHYSICS

    • TIGP-MOLECULAR SCIENCE AND TECHNOLOGY

    • Taiwan International Graduate Program for Sustainable Chemical Science

  • LI-CHYONG CHEN
  • Mon 2, 3, 4
  • Please contact the department office for more information

  • Type 1

  • 25 Student Quota

    NTU 15 + non-NTU 10

  • No Specialization Program

  • English
  • NTU COOL
  • Core Capabilities and Curriculum Planning
  • Notes
    The course is conducted in English。
  • NTU Enrollment Status

    Enrolled
    0/15
    Other Depts
    0/0
    Remaining
    0
    Registered
    0
  • Course Description
    In this course, students will learn the fundamental properties, synthesis methods and applications of various advanced materials, ranging from semiconductors, to quantum matters and low-dimensional nano-materials. Start from Si technology, you will learn the thermodynamics and kinetics of bulk and thin film growth processes. Especially, the principles and development of the specific process and factors that control the material quality will be taught. In addition, some important issues like contact problem, doping and dielectric layer would be discussed. Besides Si, the second and third generation semiconductors, such as GaAs and GaN, would be introduced. Breakthroughs in synthesis of these materials have enabled or enhanced their unique properties, which can change our daily life. After introducing the semiconductor properties and applications, we will take a step forward to a variety of materials, including ferroelectrics, oxide-based superconductor, spintronics materials, followed by energy materials such as thermoelectrics, perovskites, polymers, battery and MOF. Low-dimensional materials from 2D, 1D to 0D will be taught in the end of the course. The course is held in Room212, 2F, CCMS(physics department building)
  • Course Objective
    This multidisciplinary course will provide the knowledge of the physics and materials science of different advanced materials. Moreover, the course provides a comprehensive overview of a variety of growth methods, ranging from solution-based process, solid state synthesis, ball milling, to vapor phase deposition techniques such as sputtering, CVD, MOCVD, MBE and pulsed laser ablation. The ultimate course objective is to enhance the critical and innovative thinking of students by in depth understanding the relationship between the growth/morphology/structure of the materials and the fundamental properties, which holds the key for realizing practical applications of these advanced materials and devices.
  • Course Requirement
    General physics and General chemistry
  • Expected weekly study hours before and/or after class
  • Office Hour
  • Designated Reading
  • References
    KITTEL, Charles, Introduction to Solid State Physics, 8th edition. Wiley, 2004. CHUNG, Yip-Wah and KAPOOR, Monica, Introduction to Materials Science and Engineering, 2nd edition. CRC Press, to appear in April 2022. (1st edition published in 2006). NAKAMURA, Shuji; CHICHIBU, Shigefusa F. (ed.). Introduction to Nitride Semiconductor Blue Lasers and Light Emitting Diodes. CRC Press, 2000. NAKAMURA, Shuji; PEARTON, Stephen; FASOL, Gerhard. The Blue Laser Diode: The Complete Story. Springer Science & Business Media, 2000. XIAO, Hong. Introduction to Semiconductor Manufacturing Technology, 2nd edition. SPIE Press E-Books, 2012. PIERSON, H. O. Handbook of Chemical Vapor Deposition. Noyes Publication, 1999. JONES, Anthony C.; HITCHMAN, Michael L. (ed.). Chemical Vapor Deposition: Precursors, Processes and Applications. Royal Society of Chemistry, 2009.
  • Grading
  • Adjustment methods for students
  • Make-up Class Information
  • Course Schedule
    2/19Week 1Si, bulk and thin film growth, semiconductor fundamentals, doping, contact, dielectric, devices, beyond Moore's law (LC Chen) The course is held in Room212, 2F, CCMS(physics department building)
    2/26Week 2Si, bulk and thin film growth, semiconductor fundamentals, doping, contact, dielectric, devices, beyond Moore's law (LC Chen)
    3/4Week 3GaAs, MBE growth, direct band gap, LEDs, laser diodes, photovoltaic, etc.(LC Chen)
    3/11Week 4GaN, MOCVD growth, alloying, blue LED, lighting and HEMT (KH Chen)
    3/18Week 5Bulk crystals, solid state synthesis (& high pressure), X-ray diffraction, ferroelectrics (WT Chen)
    3/25Week 6Spintronics & quantum matters (I), sputtering principles & various industrial applications (DR Qu)
    4/1Week 7Spintronics & quantum matters (II) (DR Qu) //SiC, AlN, high power devices (LC Chen)
    4/8Week 8Battery materials (BJ Hwang) Essay due in this week
    4/15Week 9Midterm (Oral presentation)
    4/22Week 10Thermoelectrics, ball milling (KH Chen)
    4/29Week 11Solar cells, polymers and perovskites, molecular designs, solution-based processes (WF Su)
    5/6Week 12Metal-Organic Frameworks, adsorption, diffusion, membrane gas separation, CO2 capture (DY Kang)
    5/13Week 130D & 1D materials for various applications; 2D materials for catalysis (LC Chen)
    5/20Week 142D materials (I): various growth techniques (from solution-based to wafer- based), various characterizations tools (YP Hsieh)
    5/27Week 152D materials (II): electronic and optoelectronic applications (YP Hsieh)
    6/3Week 16Final Exam (Written Test)